One of the more versatile ion sources, our the 3cm DC Ion Source.

    Can be installed in myriad different ways. Capable of being mounted directly to a flange, it is much more common to see this 3cm source mounted “internally”. Whether pointed up, down, left, right, above or below,

    The 3cm source can provide a stable, consistent etch or assist ion beam from almost anywhere in your process chamber. At 7.3cm in diameter by 12cm long, the 3cm source can also fit into many places other ion sources cannot. Though the source is small, filament changes are a breeze with easy access to the filament mount posts beneath the grids.

     The 3cm ion source comes with a 2-grid graphite ion optics capable of outputting up to 75mA of beam current at 1500eV. Most commonly this ion source uses a filament neutralizer strung across the beam path. However, a downstream PBN option is available. This source requires one 2.75-inch Conflat feedthrough or two 1-inch or 32mm bulkhead feedthroughs. When mounted  directly on a flange, a 4.625-inch Conflat or larger is required. If using a PBN, one additional 1-inch or 32mm flange or larger is required. In vacuum, seven 18-inch beaded electrical leads facilitate the necessary connections.

     The I-Beam 601 Power Supply offers complete control and operation of our 3cm ion source. With many of the standard connection and communication features, it makes a quick, intuitive change from older legacy power supplies still common in the field. For PBN equipped sources, the I-Beam 602 serves the same purpose. If you need something more than our 3cm can provide, take a look at our other DC ion sources, the 8cm and the 13cm. They offer the extra beam size and ion current you may need for your larger-scale processes.